The premier destination for research on surfaces and interfaces |  | Fast-Track Your Research: Publish with JVST A | The Journal of Vacuum Science and Technology A (JVST A) is the premier destination for research on applied surface science, and the physics and chemistry of surfaces and interfaces. JVST A is proud to publish research that not only advances the fundamental understanding of interfaces and surfaces, but also applies these insights to drive innovation in technology. Authors benefit from a fast, high-quality publishing experience—with an average time to publication of just 89 days. Our rigorous peer review process ensures thorough feedback and editorial excellence, so your work receives the attention it deserves without unnecessary delays. | Explore the benefits of publishing with JVST A below. |
| | 780k+ Total article views in 2024 29 Days avg. time to 1st decision‡ 63 Days avg. time to accept‡ 89 Days avg. time to publish‡ 11.4 Cited half-life* |
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Publishing in JVST A ensures authors' cutting-edge research reaches the most relevant audience, benefiting from rigorous yet friendly peer review and contributing to the leading advancements in materials and thin films synthesized and patterned in high vacuum environments with an arsenal of techniques ranging from molecular beam epitaxy to plasma processing.
| | Eray Aydil Editor-in-Chief |
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| | | RECENTLY PUBLISHED FEATURED ARTICLES |
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 Enhancing chemical vapor deposition growth and fabrication techniques to maximize hole conduction in tungsten diselenide for monolithic CMOS integration Jatin Vikram Singh, Matthew N. Disiena, S. S. Teja Nibhanupudi, Nicholas T. Watanabe, et al.
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| | | The case for denoising/smoothing X-ray photoelectron spectroscopy data by Fourier analysis Alvaro J. Lizarbe, Kristopher S. Wright, Garrett Lewis, Gavin Murray, et al.
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| | | Effect of scanning speed on the organization and properties of CoCrFeNi fusion cladding layer Weiqian Zhu, Shanchen Wang, Zitian Zhao, Yunlong Li, et al.
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| | |  Benchmarking large language models for materials synthesis: The case of atomic layer deposition Angel Yanguas-Gil, Matthew T. Dearing, Jeffrey W. Elam, Jessica C. Jones, et al.
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| | | Recent trends in thermal atomic layer deposition chemistry Georgi Popov, Miika Mattinen, Anton Vihervaara, Markku Leskelä
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| | | Perspective on comparative radiation hardness of Ga2O3 polymorphs S. J. Pearton, Fan Ren, Alexander Y. Polyakov, Eugene B. Yakimov, et al.
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| | | Growth and properties of Sn-doped sol-gel Ga2O3 thin films Kate M. Wislang, Rodrigo Martinez-Gazoni, Roger J. Reeves, Martin W. Allen
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| | | What more can be done with XPS? Highly informative but underused approaches to XPS data collection and analysis Donald R. Baer, Merve Taner Camci, David J. H. Cant, Scott A. Chambers, et al.
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| | | Study on the thermocyclic protection performance of ultrahigh temperature ceramic SiC–Si–Hf(Ta)B2 coating for static oxidation and ablation environments up to 2300 °C Jiani Yang, Xiaoyang Guo, Yuan Tian, Yan Jiang, et al.
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| | | Editorial: Submitting your x-ray photoelectron spectral data to Surface Science Spectra Richard T. Haasch
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| | *Data from the 2024 Journal Citation Reports® Science Edition (Clarivate, 2025). ‡Publication speeds vary depending on article type |
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